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Showing 1 - 25 of 105 matches in All Departments
Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Advances in Imaging and Electron Physics, Volume 208, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
Advances in Imaging and Electron Physics, Volume 207, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
Advances in Imaging and Electron Physics, Volume 205 is the latest release in this series that merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Advances in Imaging and Electron Physics merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Coulomb Interactions in Particle Beams, Volume 223 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and computing methods used in all these domains, with this release exploring Coulomb Interactions in Particle Beams.
Advances in Imaging and Electron Physics, Volume 224 highlights new advances in the field, with this new volume presenting interesting chapters on Measuring elastic deformation and orientation gradients by scanning electron microscopy - conventional, new and emerging methods, Development of an alternative global method with high angular resolution, Implementing the new global method, Numerical validation of the method and influence of optical distortions, and Applications of the method.
Advances in Imaging and Electron Physics, Volume 226 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this release cover Characterization of nanomaterials properties using FE-TEM, Cold field-emission electron sources: From higher brightness to ultrafast beams, Every electron counts: Towards the development of aberration optimized and aberration corrected electron sources, and more. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
The Beginnings of Electron Microscopy - Part 1, Volume 220 in the Advances in Imaging and Electron Physics series highlights new advances in the field, with this new volume presenting interesting chapters on Electron-optical Research at the AEG Forschungs-Institut 1928-1940, On the History of Scanning Electron Microscopy, of the Electron Microprobe, and of Early Contributions to Transmission Electron Microscopy, Random Recollections of the Early Days, Early History of Electron Microscopy in Czechoslovakia, Personal Reminiscences of Early Days in Electron, Megavolt Electron Microscopy, Cryo-Electron Microscopy and Ultramicrotomy: Reminiscences and Reflections, and much more.
Advances in Imaging and Electron Physics, Volume 212, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
Advances in Imaging and Electron Physics, Volume 210, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains. Sections in this new release cover Electron energy loss spectroscopy at high energy losses, Examination of 2D Hexagonal Band Structure from a Nanoscale Perspective for use in Electronic Transport Devices, and more.
Coherent Electron Microscopy: Designing Faster and Brighter Electron Sources, Volume 227 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this new release cover Characterization of nanomaterials properties using FE-TEM, Cold field-emission electron sources: From higher brightness to ultrafast beams, Every electron counts: Towards the development of aberration optimized and aberration corrected electron sources, and more. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
Advances in Imaging and Electron Physics, Volume 199, the latest release in a series that merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy features extended articles on the physics of electron devices (especially semiconductor devices). Specific topics include discussions on Micro-XRF in scanning electron microscopes, and an interesting take on the variational approach for simulation of equilibrium ion distributions in ion traps regarding Coulomb interaction, amongst others. Users will find a comprehensive resource on the most important aspects of particle optics at high and low energies, microlithography, image science and digital image processing. In addition, topics of interest, including electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains are presented and discussed.
Advances in Imaging and Electron Physics merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Advances in Imaging and Electron Physics merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Advances in Imaging & Electron Physics merges two long-running serials-Advances in Electronics & Electron Physics and Advances in Optical & Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Electron energy loss spectroscopy has become an indispensable tool in surface analysis. Although the basic physics of this technique is well understood, instrument design has previously largely been left to intuition. This book is the first to provide a comprehensive treatment of the electron optics involved in the production of intense monochromatic beams and the detection of scattered electrons. It includes a full three-dimensional analysis of the electron optical properties of electron emission systems, monochromators and lens systems, placing particular emphasis on the procedures for matching the various components. The description is kept mathematically simple and focuses on practical aspects, with many hints for writing computer codes to calculate and optimize electrostatic lens elements.
"Advances in Imaging and Electron Physics "merges two long-running serials--"Advances in Electronics and Electron Physics" and "Advances in Optical and Electron Microscopy." This series features extended articles on the physics of
electron devices (especially semiconductor devices), particle
optics at high and low energies, microlithography, image science
and digital image processing, electromagnetic wave propagation,
electron microscopy, and the computing methods used in all these
domains.
Principles of Electron Optics: Second Edition, Advanced Wave Optics provides a self-contained, modern account of electron optical phenomena with the Dirac or Schroedinger equation as a starting point. Knowledge of this branch of the subject is essential to understanding electron propagation in electron microscopes, electron holography and coherence. Sections in this new release include, Electron Interactions in Thin Specimens, Digital Image Processing, Acquisition, Sampling and Coding, Enhancement, Linear Restoration, Nonlinear Restoration - the Phase Problem, Three-dimensional Reconstruction, Image Analysis, Instrument Control, Vortex Beams, The Quantum Electron Microscope, and much more.
Principles of Electron Optic: Volume Three: Wave Optics, discusses this essential topic in microscopy to help readers understand the propagation of electrons from the source to the specimen, and through the latter (and from it) to the image plane of the instrument. In addition, it also explains interference phenomena, notably holography, and informal coherence theory. This third volume accompanies volumes one and two that cover new content on holography and interference, improved and new modes of image formation, aberration corrected imaging, simulation, and measurement, 3D-reconstruction, and more. The study of such beams forms the subject of electron optics, which divides naturally into geometrical optics where effects due to wavelength are neglected, with wave optics considered.
The Properties of Ponderomotive Lenses, Volume 228 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this new release cover Characterization of nanomaterials properties using FE-TEM, Cold field-emission electron sources: From higher brightness to ultrafast beams, Every electron counts: Towards the development of aberration optimized and aberration corrected electron sources, and more. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains. |
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